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CMP fa'alelei abrasive
| Nofoaga o le Amataga: | ōmea |
| Igoa Brand: | Semixlab |
| Numera faataitaiga: | SXL-1 |
| Tusi Faamaonia: | ISO14001, ISO45001, ISO9001 |
| Lafoga Faʻatonu Aupito Manaomia: | Fa'atatau ile feutagaiga |
| tau: | Fa'afeso'ota'i mo upusii fa'apitoa |
| Faʻamatalaga: | Tagavai auina atu i fafo |
| Taimi Faaooina atu: | 15-30 Aso Ina ua maeʻa le faʻamaoniga o Poloaiga |
| Tuutuuga totogi: | T / T |
| Gafatia Tuuina atu: | 10 tone/Masina |
faʻamatalaga
CMP (Chemical Mechanical Planarization) polishing abrasive o se mea autu i le fanua o semiconductor gaosiga, tioata mata, integrated circuits, ma isi, ma ausia nano-level luga mafolafola e ala i le synergistic aafiaga o kemikolo corrosion ma masini olo.
talosaga:
CMP polishing abrasives o mea autu taua i le fanua o le tuufaatasia matagaluega gaosiga ma e mafai ona faaaoga i le tuufaatasia matagaluega ILD, semiconductor monocrystalline silicon wafers, semiconductor silicon carbide, integrated circuit paʻu vavae vavaeeseina (STI), tuufaatasia matagaluega polysilicon (Poly - Si), uamea matagaluega tuufaatasia ma apa pa uamea.
Au'aunaga e mafai ona tu'uina atu:
su'esu'ega fa'ata'ita'iga a tagata fa'atau, mea fa'atusa, fa'afitauli fa'atekinisi.
Faʻamatalaga o le kamupani:
Semixlab ei ai 2 fale suʻesuʻe, o se vaega o tagata atamamai ma 20 tausaga o meafaitino poto masani, faʻatasi ai ma le R&D ma le gaosiga, suʻega ma faʻamaoniga gafatia.
auiliili
Fa'ailoga Fa'atinoga mo 'Oloa Fa'asologa o Fa'asologa o Fa'asologa Fa'amama-Mama
| Parameter | SXL-1 | SXL-2 | SXL-3 | SXL-4 | SXL-5 | SXL-6 | SXL-7 |
| Ole SilicaParticle Tele/nm | 35 ± 5 | 45 ± 5 | 65 ± 5 | 75 ± 5 | 85 ± 5 | 100 ± 5 | 120 ± 5 |
| Nanoparticle SizeDistribution (PDI) | |||||||
| Fofo pH | 7.2-7.4 | 7.2-7.4 | 7.2-7.4 | 7.2-7.4 | 7.2-7.4 | 7.2-7.4 | 7.2-7.4 |
| Mea mautu/% | 20.5 ± 0.5 | 20.5 ± 0.5 | 20.5 ± 0.5 | 20.5 ± 0.5 | 20.5 ± 0.5 | 20.5 ± 0.5 | 20.5 ± 0.5 |
| Faʻaaliga | malamalama Blue | Lanu moaga | Lanu pa'epa'e | Paʻe-paʻepaʻe | Paʻe-paʻepaʻe | Paʻe-paʻepaʻe | Paʻe-paʻepaʻe |
| Fa'amatalaga Fa'amatalaga X | X:S- pherical;B- Pi'opi'o;P- Fa'atusa pinati;T- Bulbous;C- Pei o filifili (tulaga tu'ufa'atasi) | ||||||
| Fa'amautu ions | Organic/Inorganic Amines | ||||||
| Mea mata'utia Fa'avasega Y | Y:M-TMOS;E-TEOS;ME-TMOS+TEOS;EM-TEOS+TMOS | ||||||
| Uamea Fa'aleaga Mea | ≤300ppb | ||||||
talosaga
Avanoa autu o talosaga
| Fa'atonuga ole talosaga | Fa'aaliga masani |
| Gaosiga Semiconductor | Tu'ufa'atasi Circuit (IC) Chips ma Tulaga Tolu Mea Fa'atonu Semiconductor |
| Mata ma Fa'aaliga Tekinolosi | Mata tioata, tioata ma fa'aaliga fa'aaliga |
| Mea e teuina ai | Pepa tisiki malo ma le 3D NAND flash memory |
| Fa'apipi'i Fa'apitoa | Fa'apipi'i tulaga fa'ama'i (WLP), TSV (e ala atu i le silikoni) |
| O isi fa'aoga maualuga | MEMS (Micro-Electro-Mechanical Systems) ma Totoga Faʻafomaʻi |
Fa'amaoniga ole filifili ole si'osi'omaga
Semixlab CMP polishing abrasives faʻafeiloaʻi le tusipasi semiconductor alamanuia ma ua pasia le ISO 14001/45001/9001 tusipasi
Fa'asologa masani o talosaga
Mea mata → Abrasive Synthesis (Suiga i luga) → Slurry Formation (Filtration/PH fetuunaiga)→ CMP polishing (EPD control)→ Post-Clean → Inspection (AFM/KLA)→ Data Feedback Optimization
E ala i le faʻaogaina o le faʻasologa o mea, Semixlab CMP polishing abrasive ua ausia le alualu i luma i le tulaga o le eletise eletise semiconductor i totonu o le atunuʻu, faasolosolo malie ona suia oloa mai fafo i le maketi semiconductor, ma ua faʻaaogaina lelei i le gaosiga ma le gaosiga o LCD, OLED ma isi faʻaaliga faʻaaliga. Afai e te manaʻomia le mauaina o pepa paʻepaʻe faʻapitoa faʻapitoa poʻo le faʻatulagaina o suʻega faʻataʻitaʻiga, faʻamolemole faʻafesoʻotaʻi la matou vaega lagolago faʻapitoa.
Faʻamanuiaga Faʻamasino
Semixlab CMP fa'alelei abrasive autu lelei
a. E mafai ona fetuutuunai fua le lautele o vaega laiti ma le tikeri o le tuufaatasiga o vaega laiti;
b. Monodisperse vaega fa'atasi ma le fa'asoaina o lapopo'a tutusa;
c.Stable dispersion system;
d.Tele-tele le gaosiga gafatia ma le laititi o le batch-to-batch fesuiaiga;
e.E maualuga le mautu, e tetee atu i le faʻapipiʻiina ma le palapala.
tatou Auaunaga
Semixlab Fa'atau oloa
Semixlab CMP fa'alelei faleoloa abrasive
