ArF Photoresist Material mo Photolithography

Semixlab Photoresist Material

Photoresist e faasino i se mea etching-tetee ata tifaga manifinifi o lona solubility suia i lalo o le irradiation po o le radiation o le malamalama ultraviolet, uila eletonika, ion beam, X-ray, ma isi. Photoresist nofoia se tulaga faapitoa i le faagasologa o le gaosiga o chip circuit tuufaatasia. O le maualuga o le tuʻufaʻatasia o le fesoʻotaʻiga tuʻufaʻatasia, o le maualuga o manaʻoga mo photoresist. Semiconductor photoresists ua vaevaeina i g-laina, i-laina photoresists, KrF, ArF photoresists ma EUV photoresists, faatasi ai ma le faagasologa node o ArF photoresist o 7nm - 130nm.

O lo tatou nofoaga autu R & D e iai le tomai e atiaʻe ai monomers galue, resins galue, photosensitizers ma isi mea photoresist, ma e mafai ona ausia atoatoa le tutoatasi mai photoresist mea mata i photoresist oloa ma mea lagolago. I le taimi nei, o le faʻamaoniga o photoresists maualuga e pei o ArF faʻamago faagasologa, KrF mafiafia ata kelu, ma I-laina o loʻo faʻagasolo malie, tolu ArF photoresists ua faʻamaonia, lea e faʻamautinoa ai e mafai ona matou tuʻuina atu fofo e ogatasi ma atinaʻe lata mai i le semiconductor field.

talosaga:

ArF photoresist mea e taua tele i totonu o le fanua o gaosiga faʻatasi ma e mafai ona faʻaaogaina i faʻagasologa o gaosiga faʻatasi i le 90nm ~ 14nm ma e oʻo lava i le 7nm tekonolosi nodes. O loʻo faʻaaogaina lautele i gaosiga faʻatasi, 3D-IC faʻapipiʻi faʻapipiʻi, IC faʻapipiʻi masani ma suʻega, ma isi fanua. O lo'o fa'aaogaina lautele i le gaosiga o chips maualuga, e aofia ai tupe meataalo, AI chips, 5G chips, meataalo manatua tele, ma tupe meataalo komepiuta.

Au'aunaga e mafai ona tu'uina atu:

su'esu'ega fa'ata'ita'iga a tagata fa'atau, mea fa'atusa, fa'afitauli fa'atekinisi.

Faʻamatalaga o le kamupani:

Semixlab ei ai 2 fale suʻesuʻe, o se vaega o tagata atamamai ma 20 tausaga o meafaitino poto masani, faʻatasi ai ma le R&D ma le gaosiga, suʻega ma faʻamaoniga gafatia.

Faʻamatalaga Faʻamatalaga:

1. fa'aoga autu: E fa'aaogaina lautele i fanua e pei o le gaosiga fa'apipi'i tu'ufa'atasia, 3D-IC fa'apipi'i alualu i luma, ma fa'apipi'i IC masani ma su'ega. Ma le gaosiga o chips maualuga, e aofia ai tupe meataalo, AI chips, 5G chips, tele-mafai manatua ma cloud computing chips, ma isi.

2. Fa'ailoga autu fa'apitoa:

Substrate Si (HMDS), ata tifaga mafiafia 1.25μm, muai tao tao 100 ℃ 60sec, faʻaalia 120 ℃ 90sec, iugafono 7nm ~ 90nm, fata ola afa tausaga, teuina i le vevela maualalo, e le sili atu i le 20 ℃.

Gaoioiga tau oloa

Avanoa autu o talosaga

Fa'amaoniga ole filifili ole si'osi'omaga

193nm ArF photoresist ua faʻamaonia e le lua gaosi meataalo, teuina ma le faʻatatau, avea ma uluai ArF photoresist oloa e pasia le faʻamaoniga i Saina.

Fa'asologa masani o talosaga

Sauniuniga o mea mata → Faʻamama faʻamaʻi → Faʻamamāina o le photoresist layer(solvent clean or plasma cleaning) → Pretreatment (faʻamamaina o le acid ma le faʻagaoioia o luga) → Puleaina o le mafiafia o le photoresist layer → Faʻapipiʻiina ma faʻapipiʻi ata → Faʻaalia ma atinaʻe → Puipuiga o le etching → Faʻasologa mulimuli ane (tafi, faʻamamaina ma faʻamaʻi)

E ala i le faʻatulagaina o faʻataʻitaʻiga faʻataʻitaʻiga, ua ausia e Semixlab photoresist le alualu i luma i le tulaga o le photoresist maualuga i totonu o le atunuʻu, faasolosolo malie ona suia oloa faʻaulufale mai i le maketi semiconductor photoresist, ma ua faʻaaogaina lelei i le gaosiga ma le gaosiga o le LCD, OLED ma isi faʻaaliga faʻaaliga. Afai e te manaʻomia le mauaina o pepa paʻepaʻe faʻapitoa faʻapitoa poʻo le faʻatulagaina o suʻega faʻataʻitaʻiga, faʻamolemole faʻafesoʻotaʻi la matou vaega lagolago faʻapitoa.

Semixlab Photoresist Core manuia

Fa'amanuiaga fa'atinoga o oloa

Maualalo maualuga: faʻaleleia atili le mamanu o le taʻavale i luga o le pu, faʻaleleia le tuʻufaʻatasia ma le faʻatinoga o le pu.

O le eseesega maualuga ma le maualuga o le transmittance: fesoasoani e sili atu le ausiaina o le fesiitaiga o mamanu i le faagasologa o le lithography, faʻaleleia le saʻo ma le lelei o le lithography, ma faʻaleleia ai le gaosiga ma le faʻamaoni o le pu.

Fa'atekonolosi su'esu'ega ma atina'e lelei

Ausia atoatoa tuto'atasi mai photoresist mea mata i photoresist oloa ma mea lagolago.

ArF photoresist ua fa'amaonia mo tagata fa'atau i lalo o mea e manatua ai le 50nm ma le logic chip 55nm technology node oloa.

Fa'alautele le gafatia ma le tele o gaosiga

O le a matou ausia se fua faʻaletausaga o le 25 tone o le 193nm (ArF dry and immersion) photoresist oloa, lea o le a faʻaaogaina e atiaʻe ai le gaosiga o photoresist ma mea lagolago e faʻafetaui ai manaʻoga o le alamanuia matagaluega tuʻufaʻatasia.